FIELD: electronics. SUBSTANCE: invention refers to storages of high degree of integration and process of their manufacture. Proposed storage incorporates storage unit in which charge is recorded through configuration of tunnel junction with profile of energy zone. Profile includes barrier component relatively wide in size with relatively low height of barrier and at least one barrier component relatively narrow in size with relatively great height of barrier. There is also proposed assembly of storages and matrix of storages formed in the form of matrix of storage locations on common substrate. EFFECT: enlarged storage body, reduced dimensions of storage and its raised reliability. 64 cl, 34 dwg, 1 tbl
Title | Year | Author | Number |
---|---|---|---|
SEMICONDUCTOR STORAGE | 1998 |
|
RU2216819C2 |
SEMICONDUCTOR MEMORY DEVICE | 1999 |
|
RU2249262C2 |
MEMORY GATE FOR READ-ONLY MEMORY UNIT | 1981 |
|
SU1012704A1 |
MAGNETOELECTRIC MEMORY | 2011 |
|
RU2573207C2 |
FLASH MEMORY ELEMENT FOR ELECTRICALLY PROGRAMMABLE READ-ONLY MEMORY | 2015 |
|
RU2584728C1 |
CMOS/SOI MRAM MEMORY INTEGRATED WITH VLSI AND METHOD FOR PRODUCTION THEREOF (VERSIONS) | 2012 |
|
RU2532589C2 |
SEMICONDUCTOR STORAGE DEVICE | 2015 |
|
RU2681344C1 |
MAGNETIC RANDOM ACCESS MEMORY CELL WITH LOW POWER CONSUMPTION | 2012 |
|
RU2573757C2 |
MEMORY ELEMENT ON SILICON ON GLASS THIN FILM STRUCTURE | 2006 |
|
RU2402107C2 |
INTEGRATED STORAGE | 0 |
|
SU731864A1 |
Authors
Dates
2003-11-20—Published
1997-11-14—Filed