SEMICONDUCTOR STORAGE Russian patent published in 2003 - IPC

Abstract RU 2216819 C2

FIELD: information recording and storage. SUBSTANCE: semiconductor storage incorporates storage unit formed by gate of transistor built on semiconductor substrate and multilayer structure comprising semiconductor layers and disabling layers as insulators which is formed on storage unit. Information recording in storage unit or its erasure from storage unit are carried out thanks to injection of charges into storage unit through multilayer structure and correspondingly due to removal of charges from storage unit through multilayer structure. EFFECT: development of semiconductor storage displaying long-term memory and simultaneously stable and high-speed operation. 9 cl, 35 dwg

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RU 2 216 819 C2

Authors

Sunami Khideo

Ito Kijoo

Shimada Toshikazu

Nakazato Kazuo

Mizuta Khiroshi

Dates

2003-11-20Published

1998-10-06Filed