MEMORY ELEMENT ON SILICON ON GLASS THIN FILM STRUCTURE Russian patent published in 2010 - IPC H01L29/786 B82B1/00 

Abstract RU 2402107 C2

FIELD: physics.

SUBSTANCE: in a memory element which comprises a substrate with deposited thin layers of ceric and silicon oxide and metal electrodes for recording and deleting information is made from glass which is pre-cleaned with acetone and isopropyl alcohol, on which a ceric oxide layer is deposited at temperature higher than 600°C and thickness of more than 3 nm and a silicon film with thickness of 50-100 nm.

EFFECT: invention prolongs information storage period, simplifies the manufacturing technology and reduces production expenses.

4 cl, 4 dwg

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RU 2 402 107 C2

Authors

Milovzorov Dmitrij Evgen'Evich

Dates

2010-10-20Published

2006-10-12Filed