PROCESS OF ESTIMATION AND INCREASE OF METROLOGICAL RELIABILITY OF MEASUREMENT AIDS Russian patent published in 2004 - IPC

FIELD: appraisal, forecasting and increase of metrological reliability of electron measurement facilities. SUBSTANCE: process consists in development of mathematical models of metrological characteristics for analog unit of electron measurement aid, in statistic modeling of condition of metrological characteristics in various time sections with utilization of information on temporary change of parameters of completing elements, in construction of mathematical models of process of change of metrological characteristics in time, in determination of metrological resource of each of N analog units incorporated in measurement channel of measurement aid. Then radio elements of analog unit producing dominating effect on value of metrological characteristics are brought to light by value of normalized partial derivative of function of metrological characteristic taking into account possible spread of parameters of radio elements. Later exposed group of radio elements is divided into two subgroups. One subgroup unites radio elements in which temporary change of nominal values leads to growth of value of metrological characteristic of analog unit, another subgroup unites radio elements with reverse effect leading to decrease of values of examined metrological characteristic. Replacement of one or several radio elements in one subgroup with others is carried out with maintenance of functional integrity of circuit and serviceability of examined analog unit by method of exhaustive search proceeding from condition of maximal compensation for summary effects of functions of ageing of parameters of radio elements of both subgroups on change of values of metrological characteristic of analog unit. New modeling of condition of metrological characteristic of examined analog unit is carried out with allowance for changes introduced into circuit and new value of metrological resource is obtained. Similar procedure is used to examine other analog units integrated in measurement channel of measurement aid, value of metrological resource of each analog unit is found. Metrological resource of measurement aid is established as minimum from found values of metrological resources of all examined analog units. EFFECT: increased accuracy of estimation and enhanced metrological reliability of measurement aids. 5 dwg