IMPROVED PATTERN GENERATOR Russian patent published in 2004 - IPC

Abstract RU 2232411 C2

FIELD: printing of patterns with a high degree of precision on photosensitive surfaces, as well as at a direct recording of patterns, and in other types of precision printing.

SUBSTANCE: the given invention belongs to a device for production of a pattern on a blank that is sensitive to radiation, for example, such as a mask, display panel or a microoptical device. The device has a source of radiation and a spatial light modulator having a great number of modulating elements (pixels). It consists of an electronic data processing and supply system feeding exciting signals to the modulator, precision mechanical system for displacement of the mentioned blank, and an electronic control system coordinating the blank displacement, supply of signals to the modulator and intensity of radiation so that the mentioned pattern would be stitched of partial pixels produced by a succession of partial patterns.

EFFECT: the exciting signals may set more than two states of modulating elements.

37 cl, 8 dwg

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RU 2 232 411 C2

Authors

Sandstrem Torb'Ern

Dates

2004-07-10Published

1999-03-02Filed