FIELD: electronics.
SUBSTANCE: method is intended for application in manufacture of integrated circuits, information carriers, flat displays, etc. and consists in that a gas-absorbing device in activated state is brought into interaction with working gas medium in evacuated working chamber, wherein sum of partial pressures of chemically active gases does not exceed 10-3 mbar (0.1 Pa). Before the precipitation process is started, gas-absorbing device is removed from the working chamber using automated equipment and substrate manipulation operations, while maintaining vacuum or pressure within the chamber favoring precipitation process.
EFFECT: increased yield of valid produce due to reduced pollution of working medium and chamber evacuation time.
11 cl, 8 dwg, 2 ex
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