FIELD: electronic and emission equipment; production of a diamond-like films.
SUBSTANCE: the invention is pertaining to the field of production of the ultra-hard coatings in vacuum, in particular, to the methods of formation of a diamond=like coating and may be used in electronic and emission engineering in the capacity of optical details coatings and as decorative coatings. The method provides for location of a base sheet in a discharge chamber, vacuumization of the chamber, feeding of a carbon-containing gaseous working medium in the chamber and creation in it of a plasma discharge with the following maintaining a mode of a plasma discharge for the duration of deposition of the diamond-like film. The carbon-containing gaseous working medium is fed as a gaseous suspension, which was prepared before the feeding by spraying outside the chamber in gas of a reduced pressure of the solid carbon-containing particles of the preliminary formed structure, dimension and composition. The invention ensures improved quality of the film due to improvement of structure and composition of the diamond-like film.
EFFECT: the invention ensures improved quality, structure and composition of the diamond-like film.
5 cl, 2 dwg
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Authors
Dates
2005-06-20—Published
2003-08-07—Filed