VACUUM ION-PLASMA PLANT FOR APPLYING COATINGS ON SURFACE OF METAL INTRAVASCULAR STENTS, MAINLY FROM TITANIUM OXYNITRIDE Russian patent published in 2019 - IPC C23C14/35 C23C14/56 H01J37/305 

FIELD: metallurgy.

SUBSTANCE: invention relates to an ion-plasma plant for applying coatings on the surface of intravascular metal stents, mainly titanium oxynitride. Proposed plant comprises sluice chamber 6 with article loading table 8, gas plasma generator 7 for preliminary ion-plasma treatment of articles, cylindrical vacuum chamber 1 with axially arranged inside its volume dual magnetron sputtering system (MSS) , upper cover (4) for connection of gate (5) of sluice chamber (6), high-vacuum pumping system, three-channel gas supply system (11), automatic control system (16), means of technological process control, as well as power supply sources: MSS (12), displacement potential of working table (13), incandescence of cathode (14) and gas discharge (15) of plasma generator. MSS consists of two magnetron electrodes (2), each of which includes cylindrical cathode (3) with intrinsic magnetic system. Magnetron electrodes (2) are insulated relative to each other and housing of vacuum chamber (1).

EFFECT: ensuring uniform deposition of coatings on intravascular stents – items having complex spatial geometry.

6 cl, 2 dwg