FIELD: ultra-violet radiation.
SUBSTANCE: the mirror-monochromator has a multi-layer structure positioned on a supporting structure and including a periodic sequence of two separate layers (A,B) of various materials forming a layer-separator and a layer-absorber with a period having thickness d, Bragg reflection of the second or higher order is used. Mentioned thickness d has a deviation from the nominal value not exceeding 3%. The following relation is satisfied: (nAdA + nBdB)cos(Θ) = m λ/2, where dA and dB - the thicknesses of the respective layers; nA and nB - the actual parts of the complex indices of reflection of materials of layers A and B; m - the integral number equal to the order of Bragg reflection, which is higher than or equal to 2, λ - the wave-length of incident radiation and Θ - the angle of incidence of incident radiation. For relative layer thickness Г=dA/d relation Г<0.8/m is satisfied.
EFFECT: provided production of a multi-layer mirror, which in the range hard ultra-violet radiation has a small width of the reflection curve by the level of a half of the maximum at a high reflection factor in a wide range of the angles of incidence.
6 cl, 1 dwg
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Authors
Dates
2006-08-20—Published
2003-02-21—Filed