X-RAY FLUX CONTROL DEVICE AND ITS MANUFACTURING PROCESS Russian patent published in 1998 - IPC

Abstract RU 2109358 C1

FIELD: X-ray optics; X-ray lithography, X-ray microscopy, X-ray spectroscopy; astronomy, physics, biology, medicine, and other industries where X-radiation is used. SUBSTANCE: device has substrate carrying alternating layers with different increments; layer material is composed of carbon and hydrogen atoms. Difference in layer decrements is ensured due to different hydrogen content and spatial structure of layers. Device is manufactured as follows. Formed on substrate is multilayer structure with layers having different decrements varying to obey desired law. At least one layer is formed by deposition from gaseous medium. EFFECT: improved working characteristics due to reduced absorption of X-radiation, increased resolution and band width, improved layer-to-layer interface, facilitated manufacture of device. 17 cl, 6 dwg

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RU 2 109 358 C1

Authors

Baranov A.M.

Kondrashov P.E.

Smirnov I.S.

Dates

1998-04-20Published

1996-05-17Filed