PLANT FOR ION-PLASMA DEPOSITION OF COATINGS IN VACUUM Russian patent published in 2006 - IPC C23C14/34 C23C14/56 

FIELD: vacuum ion-plasma treatment of surfaces, namely for deposition of coating, possibly in machine engineering, instrument making for applying coatings onto articles of metals and alloys, dielectric and other materials and for modifying surfaces of construction materials and tools.

SUBSTANCE: plant includes vacuum chamber 1. Plasma sources, systems for evacuating, supplying and controlling gas flow rate, power sources and control unit. Carcass 8 of chamber 1 has openings for mounting lids 25 in them with possibility of restricted rotation around their own axes relative to vacuum chamber 1 and with possibility of fluid-tight connection with carcass 8. Plasma sources are mounted on said lids. Carcass 8 is provided with rotary frames having guides in which lids 25 in the form of round flanges are jointly mounted with possibility of restricted rotation and fixation to carcass 8.

EFFECT: possibility for depositing high-quality coating onto complex three-dimension parts or onto large number of parts placed in vacuum chamber.

4 cl, 6 dwg