METHOD OF TREATMENT OF CERAMIC SUBSTRATE (VERSIONS) Russian patent published in 2007 - IPC C09K3/14 C09G1/02 C04B41/91 

Abstract RU 2292372 C2

FIELD: treatment of ceramic substrates, namely polishing of ceramic substrates.

SUBSTANCE: proposed method of treatment of ceramic substrate containing aluminum includes the following operations: introduction of suspension between substrate and working tool; suspension contains abrasive and additive containing oxo-phosphoric or organo-phosphoric compound at concentration between 0.05 and 5 weight-%; then, substrate is set in motion relative to working tool. Method of treatment of substrate containing aluminum includes introduction of suspension containing abrasive and additive containing in its turn oxo-phosphoric or organo-phosphoric compound at concentration between 0.05 and 5 weight-%. Substrate is brought in contact with working tool in such way that suspension is introduced between substrate and working tool; then substrate is set in motion in such way that its speed relative to working tool is no less than 2.0 m/s.

EFFECT: increased rate of removal of material; improved service characteristics.

34 cl, 5 dwg, 5 tbl

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RU 2 292 372 C2

Authors

Lakonto Ronald U.

Uord Duglas E.

Dates

2007-01-27Published

2004-03-29Filed