COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING (CMP) CONTAINING PROTEIN Russian patent published in 2017 - IPC C09G1/02 C09K3/14 B24B1/00 H01L21/304 H01L21/461

Abstract RU 2631875 C2

FIELD: chemistry.

SUBSTANCE: invention relates to the composition for chemical-mechanical polishing (CMP) and its use in polishing substrates of a semiconductor industry. The composition comprises cerium oxide particles, a protein containing cysteine as an amino acid unit, and an aqueous medium.

EFFECT: composition exhibits improved polishing characteristics.

12 cl, 1 tbl

Similar patents RU2631875C2

Title	Year	Author	Number
COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING (CMP) CONTAINING NON-ION SURFACTANT AND CARBONATE SALT	2013	Rajkhardt Robert Li Yuzhuo Lauter Mikhael Chiu Vej Lan Uilyam	RU2643541C9
CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIUM DIOXIDE	2014	Lauter Mikhael Li Yuzhuo Noller Bastian Marten Lange Roland Rajkhardt Robert Lan Jongking Bojko Volodimir Kraus Aleksander Sejerl Joakhim Von Usman Ibrakhim Shejk Ansar Zibert Maks Khartnagel Kristin Dengler Joakhim Khilleskhajm Nina Syuzann	RU2661571C2
COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING CONTAINING POLYVINYL PHOSPHON ACID AND DERIVATIVES THEREOF	2011	Raman Vidzhaj Immanuil Li Yuzhio Shade Kristian Venkataraman Shiam Sundar Su Ison Yu-Shen Usman Ibrakhim Shejk Ansar	RU2598046C2
COMPOSITION FOR CHEMICAL-MECHANICAL POLISHING (CMP), CONTAINING NON-IONIC SURFACTANT AND AROMATIC COMPOUND CONTAINING ACID GROUP	2013	Rajkhardt Robert Li Yuzhuo Lauter Mikhael	RU2636511C2
AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES	2011	Li Yuzhuo Chu Dzhea-Dzhu Venkataraman Shiam Sundar Usman Ibrakhim Shejk Ansar Pinder Kharvi Uejn	RU2607214C2
CHEMICAL-MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING BENZOTRIAZOLE DERIVATIVES AS CORROSION INHIBITORS	2014	Rajkhardt Robert Kaller Martin Lauter Mikhael Li Yuzhuo Klipp Andreas	RU2669598C2
AQUEOUS POLISHING COMPOSITION AND METHOD FOR CHEMICAL-MECHANICAL POLISHING OF SUBSTRATES, CONTAINING FILM BASED ON SILICON OXIDE DIELECTRIC AND BASED ON POLYCRYSTALLINE SILICON	2011	Venkataraman Shiam Sundar Su Ison Yuj-Shen Kingma Arend Jouke Noller Bastian Marten	RU2588620C2
AQUEOUS POLISHING COMPOSITION AND METHOD FOR CHEMICAL-MECHANICAL POLISHING OF SUBSTRATES, HAVING STRUCTURED OR UNSTRUCTURED DIELECTRIC LAYERS WITH LOW DIELECTRIC CONSTANT	2011	Raman Vidzhaj Immanuel Rittig Frank Li Yujchzho Chiu Vej Lan Uilyam	RU2589482C2
AQUEOUS POLISHING COMPOSITION AND METHOD FOR CHEMICAL-MECHANICAL POLISHING OF SUBSTRATES HAVING POLYSILICON AND SILICON OXIDE DIELECTRIC FILMS	2011	Li Juzhuo Chu Dzhea-Dzhu Venkataraman Shiam Sundar Chiu Vej Lan Uilliam Pinder Kharvi Uehjn	RU2573672C2
AQUEOUS POLISHING COMPOSITION CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR SALTS OF N-SUBSTITUTED N'-HYDROXY-DIAZENIUM OXIDES	2011	Noller Bastian Frants Diana Li Yuzhuo Usman Ibrakhim Shejk Ansar Pinder Kharvi Uejn Venkataraman Shiam Sundar	RU2608890C2

RU 2 631 875 C2

Authors

Li Yuzhuo

Noller Bastian Marten

Lauter Mikhael

Lange Roland

Dates

2017-09-28—Published

2013-01-25—Filed