FIELD: cryoelectronics; production of high-temperature superconductor film components and circuits.
SUBSTANCE: prior to applying high-temperature superconductor coating buffer sublayer surface is treated by ion-plasma etching up to class 10-13 at the same time doping buffer sublayer surface with 20-30% dope of materials enhancing critical parameters of high-temperature superconductor coating.
EFFECT: enhanced quality of coatings, their adhesion, and critical parameters.
1 cl, 4 dwg
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