METHOD FOR MANUFACTURING NANO-MOULDS FOR CONTACT PRESS-LITHOGRAPHY (VARIANTS) Russian patent published in 2007 - IPC C25D1/10 

FIELD: nanotechnology for microelectronics.

SUBSTANCE: in accordance to the invention, for each sort or type of repeating element in accordance to focused ion probe method one replica is manufactured in conductive material, onto each replica an adhesive layer is applied using an electro-chemical method, then by galvanoplastics method a layer of metal 50-100 mcm thick is applied to create a separate mould, which is separated from replica, then by repeating operations with the same replica remaining moulds of this sort or type of repeating element are produced, and for each non-repeating element by focused ion probe method one replica is manufactured, from which by repeating operations for producing moulds of repeating element a single mould for non-repeating element is produced, and master mould is created by precise positioning on common substrate. In accordance to the method, for each sort or type of repeating element and for each non-repeating element by focused ion probe method one replica is manufactured in conductive material, onto each replica an adhesive layer is electro-chemically applied, and then a layer of metal 50-100 mcm thick to create a separate element, it is held in press-manipulator and separated from replica, and master-mould is formed by moving substrate for precise positioning relatively to mould held in press-manipulator, during realization of contact press-lithography in required positions for a number of times equal to number of repeating elements, and once for non-repeating elements.

EFFECT: increased efficiency.

2 cl, 6 dwg