DEVICE FOR WASHING AND DRYING ROUND SEMICONDUCTOR SUBSTRATE AND REMOVING DROPS FROM ITS SURFACE Russian patent published in 2024 - IPC H01L21/02 

FIELD: various technological processes.

SUBSTANCE: invention can be used for deep high-quality cleaning of surface in production of IC, LSI and VLSI. Essence of the invention consists in the fact that a device for washing and drying a round semiconductor substrate and removing drops from its surface with a Marangoni effect comprises a bath for washing substrates and a drying chamber, as well as a substrate carrier attached to the vertical movement mechanism with acute-angled projections with recesses for holding the substrate, each of which has a channel creating a rarefaction in the zone of contacts of the substrate and the carrier, having a diameter greater than the thickness of the processed substrate, but less than the base of the protrusions, which changes into a channel of a larger diameter, wherein substrate carrier is composed of housing with concave top surface while number of acute-angled projections with channels is at least five.

EFFECT: providing the possibility of improving the quality of processing a round semiconductor substrate.

3 cl, 9 dwg