MANUFACTURING METHOD FOR THIN-FILM RESISTORS Russian patent published in 2008 - IPC H01C17/75 

FIELD: electricity.

SUBSTANCE: manufacturing method for thin-film resistors includes applying resistive layer on base material, cleaning of resistive layer surface at least on the area of adhesion contact with conductor layer of two-layer structure with solution containing 80.0 g of bichromate (K₂Cr₂O₇) in 1.0 l and sulphuric acid (H₂SO₄) within 3÷40 s at solution temperature within 20÷22°C, excluding, on one hand, residuals of organic compounds and, on the other hand, chrome adsorption on resistive layer surface with subsequent washing for example in deionized water, and applying onto cleaned surface the conductive layer in the from of two-layer structure where vanadium is taken as material for adhesive sublayer.

EFFECT: improvement of resistor reliability by decrease of contact resistance at the place of conductive layer application onto resistive layer and reduction of labor consumption during resistors manufacturing.

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