FIELD: metallurgy.
SUBSTANCE: invention relates to production method of high purity molybdenum and can be used while manufacturing of high-clean molybdenum ingots, and also of sheet products made of high-clean molybdenum for usage in microelectronics, quantum electronics and electrician. Method includes vacuum refining by means of electron-beam remelt and melt crystallisation. Refining is implemented by means of two electron-beam remelting. For the first electron-beam remelting there are subject to metal-ceramic intermediates, prepared of sintered molybdenum, and it is implemented at a low rate. The second electron-beam remelting is implemented at maximum possible high rate for forming of fine-grain structure in high-clean molybdenum ingots. Ratio between diameters of molds for the first and the second remelt is d1/d2=0.5. Melt crystallisation is implemented in vertically supported molds of round or rectangular cross-section with receiving of cylindrical or rectangular ingots, or in horizontally supported round or rectangular molds with receiving of round or rectangular flat-shaped ingots.
EFFECT: improvement and reliability enhancement of metallurgical products (sheet products, foil paper, wire, storage plates).
2 tbl, 1 ex
Title | Year | Author | Number |
---|---|---|---|
METHOD OF MOLYBDENUM OF HIGH PURITY MANUFACTURING | 2007 |
|
RU2349657C1 |
HIGH-PURITY SPUTTERING MOLYBDENUM TARGET AND METHOD OF ITS PRODUCTION | 2007 |
|
RU2365673C2 |
SPRAYED TARGETS OF HIGHLY PURE ALLOYS ON BASIS OF TRANSITION METALS AND METHOD OF THEIR PRODUCTION | 2009 |
|
RU2392685C1 |
METHOD OF MANUFACTURING TUNGSTEN OF HIGH PURITY | 2007 |
|
RU2349658C1 |
METHOD FOR PRODUCTION OF HIGHLY PURE TUNGSTEN FOR SPATTERING TARGETS AND DEVICE FOR ITS REALISATION | 2008 |
|
RU2375480C1 |
MANUFACTURING METHOD OF CAST TARGET FROM MOLYBDENUM-BASED ALLOY FOR MAGNETRON SPUTTERING | 2010 |
|
RU2454484C2 |
MANUFACTURING METHOD OF SPUTTERING TARGETS FROM CAST DISILICIDE OF REFRACTORY METAL AND FACILITY FOR ITS IMPLEMENTATION | 2007 |
|
RU2356964C1 |
METHOD OF PRODUCTION OF HIGH PURITY TITANIUM FOR SPUTTERED TARGETS | 2008 |
|
RU2370559C1 |
COMPOSITE TARGET FOR SPRAYING AND METHOD OF ITS PRODUCTION | 2009 |
|
RU2392686C1 |
TUNGSTEN-TITANIC TARGET FORMAGNETRON SPUTTERING AND METHOD OF ITS RECEIVING | 2007 |
|
RU2352684C1 |
Authors
Dates
2009-04-10—Published
2007-11-02—Filed