FIELD: technological processes.
SUBSTANCE: method for production of composite target for magnetron spraying includes deep vacuum refining by multiple remelting of components, manufacturing of disk, in which in sprayed zone, along two concentric circumferences holes are drilled, and cylindrical inserts are fixed in it by means of press fit, polycrystalline flat bar of molybdenum is produced, disk with holes is made from it, where cylindrical inserts are fixed made of single crystals of vanadium and rhenium. Composite target for magnetron spraying is produced by above specified method and consists of cast disk and cast cylindrical inserts arranged in sprayed zone of disk along two concentric circumferences in staggered order, disk is made of polycrystalline molybdenum and comprises cast cylindrical inserts made of monocrystalline vanadium and rhenium. In composite target ratio of areas on surface of target occupied with vanadium, rhenium, molybdenum, so that as a result of spraying films are produced with the following composition: 12-50 wt % of vanadium, 3.5-27 wt % of rhenium, the rest - molybdenum.
EFFECT: improved quality and reliability of contact-barrier films in integral circuits.
3 cl, 1 tbl, 1 ex
