MANUFACTURING METHOD OF CAST TARGET FROM MOLYBDENUM-BASED ALLOY FOR MAGNETRON SPUTTERING Russian patent published in 2012 - IPC C23C14/35 C22C27/04 H01J23/00 

FIELD: metallurgy.

SUBSTANCE: manufacturing method of cast target for magnetron sputtering from molybdenum-based alloy and target obtained using the above method is proposed. Method involves obtaining of an ingot of alloy on the basis of molybdenum. First, high-purity polycrystalline molybdenum ingot is obtained by means of deep vacuum refining by electron-beam drip re-melting of a workpiece made from high-purity molybdenum; after that, arc vacuum remelting of high-purity polycrystalline molybdenum ingot is performed with strips from high-purity monocrystalline silicon; at that, the number of strips is chosen from the condition for obtaining polycrystalline alloy ingot with composition of molybdenum - 0.005-1.0 wt % of silicon, which is subject to machining.

EFFECT: improving the quality of semiconductor devices and integral circuits due to improvement of chemical resistance of films, as wells as stability of value of transient resistance of contacts at heat treatment.

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