FIELD: metallurgy.
SUBSTANCE: it is implemented deep vacuum refinement by multiple remelting of tungsten and titanium with receiving of polycrystalline ingots of titanium and tungsten monocrystal. Then from the polycrystalline ingot of titanium it is manufactured disk, in which in diffusing area per two concentric circles alternate there are bored holes and by press fit there are fixed in it cast cylindrical inserts from tungsten monocrystal, preliminarily subject to grinding and cutting per exact lengths. Target, recived by mentioned method, consists of cast disk made of high-clean titanium and cast cylindrical inserts made of high-clean monocrystalline tungsten, located in diffusing area of disk by two concentric circles alternate. Additionally area ratio on surface of target, taken up by tungsten and titanium, provides receiving of films at magnetron sputtering composition 35-40 wt % of titanium, tungsten is the rest.
EFFECT: improving and reliability growth of applied films of barrier plate tungsten - titanic alloy.
3 cl, 4 dwg, 1 ex
