FIELD: instrument making.
SUBSTANCE: invention relates to opto-electronic instrument making, particularly, to microchannel plate (MCP) production and can be used in electrooptical transducers. The proposed method of MCP recovery comprises processing of etched MCP blanks in several steps. Note here that the fist step comprises heat treatment in dry nitrogen medium at 440 to 445°C, for 1.0 to 1.5 h. the second stage comprises heat treatment in hydrogen medium at 400 to 420°C, for 6 to 8 h. The third step comprises chemical treatment in hydrogen nitrate solution at ambient temperature for 10 to 20 min with subsequent flushing in deionised water at aforesaid temperature for 20 to 30 min and dry-air drying at 80 to 120°C for 1.5 to 2.0 h. The fourth step comprises heat treatment in air at 450 to 460°C, for 1.5 to 2.0 h. The fifth step comprises chemical treatment in hydrogen atmosphere at 460 to 470°C for 0.5 to 1.0 h. The sixth, final step, comprises, chemical treatment in dry nitrogen atmosphere at 470 to 500°C for 1.5 to 2.0 h with subsequent cooling to 380°C, at the rate of less than 0.5°C, and further inertial cooling to ambient temperature.
EFFECT: purity of channel surface, improved appearance of MCP, reduced gas content and emission, MCP higher quality and reliability.
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Authors
Dates
2009-07-10—Published
2008-01-09—Filed