METHOD OF MANUFACTURING ETCHED SEMI-FINISHED MICROCHANNEL PLATE PRODUCTS Russian patent published in 2003 - IPC

FIELD: optoelectronic engineering. SUBSTANCE: method includes etching of supporting thread from channels of microchannel plate in aqueous hydrochloric acid and sodium hydroxide solution, washing in distilled or deionized water after each treatment, and dehydration, said etching, more particularly, being performed through consecutively treating semi-finished products with 0.2 N hydrochloric acid solution at 20+/-2 C for 4+/-0.2 h, 8-12% sodium hydroxide solution at 70-80 C for 5-15 min, and, additionally, 8-12% nitric acid solution at 20+/-2 C for 10-20 min, followed by dehydration in isopropyl alcohol at 20+/-2 C for 5-15 min and dry-air drying in thermostat at 80-100 C for al 2 h. EFFECT: improved quality of microchannel plates due to decreased channel clogging level and improved clarity of electronic image viewing field, increased cellular structure threshold, and improved maintainability of microchannel plates. 6 cl