FIELD: chemistry.
SUBSTANCE: invention relates to thin-film interference coatings for coating optical elements. A method is proposed for making thin 50-200 nm single-layer antireflection coating based on mesoporous silica on objects made from silicate glass with transmission maximum of 97.0 to 98.5% in the visible spectrum, involving a) sol-gel process of silicon tetraalkoxide in the presence of an organic additive in concentration of 0.1 to 5.0 wt % to the weight of the sol, using nanostructure self-organising techniques, induced by evaporating solvent EISA, b) heating a sample with coating in an air atmosphere at 300 to 600°C for several hours for thermal decomposition of the organic additive. The organic additive, which determines spontaneous micro-separation of inorganic and organic phases during formation of solid coating on glass, is in form of carbon-chain polymers, which contain lateral ether or ester groups or carbon-chain static copolymers, containing ether groups and ester groups.
EFFECT: design of a method of obtaining cheap coating with low refraction index of 1,25-1,34.
1 cl, 7 dwg, 7 ex
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD FOR PRODUCTION OF THIN ANTIREFLECTION LAYERS BASED ON MESOPOROUS SILICON DIOXIDE BY SOL-GEL METHOD IN PRESENCE OF OLIGOMERS OF ETHYLENE OXIDE, OLIGOMERS OF PROPYLENE OXIDE | 2007 |
|
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| METHOD OF PRODUCING SILICON DIOXIDE-BASED THIN NANOSTRUCTURED SINGLE-LAYER COATINGS VIA SOL GEL METHOD IN PRESENCE OF INORGANIC ACIDS AND SALTS THEREOF | 2010 |
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