FIELD: construction.
SUBSTANCE: thin monostratal antireflection layers with thickness of 50-200 nm and with refractive index of 1.27-1.40 are produced by sol-gel method of silicon tetraalcoxide in presence of organic additive in concentration of 0.1-5.0 wt % to sol weight. Organic additive used is represented by monobasic, bibasic and polybasic organic acids, functional derivatives of organic acids, which contain groups - OH, -NH2, >NH, >CO, esters of organic acids.
EFFECT: reduction of refractive index of antireflection nanoporous layer.
6 ex, 6 dwg
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