FIELD: construction.
SUBSTANCE: layers are produced by sol-gel method of silicon tetraalcoxide in presence of organic additive in concentration of 0.1-5.0 wt %. Organic additive used is represented by oligomers of ethylene oxide and oligomers of propylene oxide of different molecular mass. Then sample with layer is heated in air atmosphere at 300-600°C for several hours. As a result of performed operations, thin monostratal antireflection layers are produced with thickness of 50-200 nm and with low refractive index equal to 1.23-1.25.
EFFECT: reduced refractive index of antireflection nanoporous layer.
4 ex, 4 dwg
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