FIELD: metallurgy.
SUBSTANCE: system for creation of magnetic field of magnetron device includes two installed opposite to each other unbalanced magnetron, on inner surface of which there are fixed implemented of homogeneous material targets and each of which allows oriented in opposite directions internal and external annular magnetic poles. External pole of one magnetron and external pole of other magnetron allow opposite polarity. System allows also two installed opposite to each other high-speed, cooled balanced magnetrons, at inner surface of which there are fixed mosaic faces and each of which allows oriented in opposite directions internal and external annular magnetic poles. In spaces between two couples of unbalanced and balanced magnetron which are located between its annular magnetic poles of the same polarity, are located installed opposite to each other two ion sources with cold cathode implemented in the form of oriented in opposite directions internal and external annular magnetic poles. External pole of each ion source allows polarity, opposite to polarity of external poles of nearest to it unbalanced and balanced magnetron. In two other spaces between two couples of unbalanced and balanced magnetrons which are located between its external annular magnetic poles of different polarity, there are located installed opposite to each other two arc sources of metallic ions with stabilising coils. Method includes following operations: installation of products in planetary carrousel, ion etching and activation of products by means of unbalanced magnetrons, additional activation of products by means of ion source, generating gas ions, heating of products, application of primary coating by means of unbalanced magnetrons, application of secondary coating up to thickness 10 mcm by means of simultaneous using of unbalanced magnetrons and balanced magnetrons, application of main layer of coating by means of simultaneous using of unbalanced and balanced magnetrons, application of main layer with multilayer nanocrystalline structure by means of simultaneous using of unbalanced magnetrons and balanced magnetrons and arc-discharge sources.
EFFECT: increase in efficiency and versatility of process.
5 cl, 2 dwg
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Authors
Dates
2010-01-20—Published
2006-07-26—Filed