FIELD: nanotechnologies.
SUBSTANCE: invention relates to the field of membrane technologies and industry of nanosystems, and may be used in production of micro- and nanofluid filters, biosensor devices, medical diagnostics instruments. Concept of the invention is as follows: in method for production of silicon microchannel membrane in monolithic framing, anode etching of single-crystal silicon plate of hole type with seed pits on surface in solution of electrolytes, containing ions of hydrogen and fluoride is interrupted with electric polishing and further removal of sacrificial microchannel membrane, afterwards anode etching is restored.
EFFECT: improved coefficient of transparency and mechanical strength of membranes, better operational characteristics and expanded assortment of items.
4 cl, 5 dwg, 2 ex
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