METHOD OF PRODUCING SILICON MICROCHANNEL MATRIX Russian patent published in 2011 - IPC H01L21/3063 B82B3/00 

FIELD: physics.

SUBSTANCE: invention relates to membrane membrane technology and can be used to produce micro- and nano-fluid filters, biosensors, medical diagnosis devices, as well as in making elements of electro-optical converters and X-ray optics. In the method of producing a silicon microchannel matrix, anodic etching of a p-type microcrystalline silicon wafer with inoculating cavities on the surface in an aqueous solution of electrolytes which contains hydrogen and fluoride ions is carried out in conditions with time variation of electric current density according to a third-order hyperbolic law. An exponential law holds if a surfactant or alcohol is added to the solution. The law includes three fixed coefficients which depend on the type of solution of the electrolyte and structural parameters of the microchannel matrix.

EFFECT: improved operational characteristics of silicon microchannel matrices by endowing the microchannels with the required profile.

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