FIELD: physics.
SUBSTANCE: installation for plasma treatment of infinite material (1) has at least one vacuum discharge chamber (3a) through which the infinite material can be moved continuously. A power supply device (30) supplies electric discharge energy to discharge gaps (G) between the external electrode (5, 51-57) of the corresponding discharge chamber and the infinite material as an internal electrode. The power supply device is a current source capable of pulsed supply of discharge energy, where the said current source has at least one inductance element (32) as an energy accumulator connected together with the discharge gap (G) with which it is matched or connected in series with several discharge gaps matched with it.
EFFECT: high input power and uniformity of treatment, possibility of series-connection of several discharge chambers without intermediate contact with infinite material.
24 cl, 14 dwg
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