FIELD: electricity.
SUBSTANCE: in method of manufacturing of stepped altitude calibration standard for profilometry and scanning probe microscopy, silicon substrate with vicinal surface is placed into vacuum, and thermoelectric annealing is carried out, forming monoatomic steps on surface of substrate, separated with wide terraces with initial surface reconstruction, then substrate is cooled, forming subatomic steps on terraces by provision of neighbouring areas of substrate surface with superstructure reconstruction and areas, which have not been exposed to superstructure reconstruction, but have not remained in the condition of initial surface reconstruction, evenly distributed on surface of substrate, and level of vacuum is maintained as providing for output of substrate material atoms into vacuum during thermoelectric annealing.
EFFECT: invention provides for reproducibility of measurements, increased accuracy of relief features altitude detection, reduced error of measurements, reduced altitude of calibration reference sample.
14 cl, 8 dwg
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Authors
Dates
2010-12-20—Published
2009-09-07—Filed