FIELD: metallurgy.
SUBSTANCE: nanodimensional structure with nanowires from tin atoms, embedded in a GaAs crystal, includes a single-crystal semi-insulating vicinal GaAs (100) substrate with misorientation angle of 0.3°÷0.4° in the direction of type <011>, a buffer undoped GaAs layer, a delta-alloyed tin layer, and a contact silicon-alloyed GaAs layer; an InGaAs channel layer, an AlGaAs spacer layer, and an AlGaAs barrier layer are additionally added, and two-dimensional electron gas located in InGaAs channel layer is modulated in form of quasi-one-dimensional channels.
EFFECT: ensuring the possibility of increasing the speed of microwave devices based on this structure.
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Authors
Dates
2018-04-16—Published
2016-10-07—Filed