PLASMA REACTOR FOR HIGH-SPEED DEPOSITION OF DIAMOND FILMS FROM GAS PHASE Russian patent published in 2011 - IPC C23C16/27 C23C16/503 

Abstract RU 2416677 C1

FIELD: power industry.

SUBSTANCE: plasma reactor includes microwave generator, transmission line ending with quasi-optical electrodynamic system, and reaction chamber with base installed in it for deposition of diamond film. Transmission line is made in the form of common waveguide system combining the output waveguide of microwave generator with emission on operating mode and divider of one beam into two equal wave beams. Reaction chamber is made in the form of closed solid metal convex screen with possibility of reflecting the microwave emission dissipated to the base. Mirrors of quasi-optical electrodynamic system are fixed inside reaction chamber on its side wall.

EFFECT: considerable reduction of losses of microwave energy both during its transmission from microwave generator to reaction chamber, and in reaction chamber itself.

3 cl, 2 dwg

Similar patents RU2416677C1

Title Year Author Number
HIGH-SPEED METHOD FOR DEPOSITING DIAMOND FILMS FROM GAS PHASE IN PLASMA OF SHF-DISCHARGE AND PLASMA REACTOR FOR PERFORMING THE SAME 2002
  • Vikharev A.L.
  • Gorbachev A.M.
  • Litvak A.G.
  • Bykov Ju.V.
  • Denisov G.G.
  • Ivanov O.A.
  • Koldanov V.A.
RU2215061C1
HIGH-CURRENT ION SOURCE BASED ON A DENSE PLASMA OF ECR DISCHARGE, KEPT IN AN OPEN MAGNETIC TRAP 2018
  • Golubev Sergej Vladimirovich
  • Denisov Grigorij Gennadevich
  • Izotov Ivan Vladimirovich
  • Razin Sergej Vladimirovich
  • Sidorov Aleksandr Vasilevich
  • Skalyga Vadim Aleksandrovich
  • Sobolev Dmitrij Igorevich
RU2697186C1
METHOD FOR SPHEROIDIZATION OF METAL MICRO-POWDERS BY MICROWAVE RADIATION 2022
  • Sintsov Sergej Vladislavovich
  • Vodopyanov Aleksandr Valentinovich
  • Chekmarev Nikita Vladislavovich
RU2782748C1
METHOD FOR POWER TRANSMISSION IN VACUUM 1997
  • Alikaev Vladimir Vladimirovich
  • Egorov Avenir Nikolaevich
  • Latyshev Leonid Alekseevich
  • Semashko Nikolaj Nikolaevich
RU2117398C1
MICROWAVE PLASMA REACTOR FOR GAS-PHASE DEPOSITION OF DIAMOND FILMS IN GAS FLOW (VERSIONS) 2014
  • Vikharev Anatolij Leontevich
  • Gorbachev Aleksej Mikhajlovich
  • Lobaev Mikhail Aleksandrovich
  • Batler Dzhejms Ekhrich
RU2595156C2
PLASMA MICROWAVE REACTOR 2016
  • Vikharev Anatolij Leontevich
  • Gorbachev Aleksej Mikhajlovich
  • Lobaev Mikhail Aleksandrovich
RU2637187C1
DIAMOND COATING DEVICE 2022
  • Rebrov Aleksei Kuzmich
  • Timoshenko Nikolai Ivanovich
  • Emelianov Aleksei Alekseevich
  • Iudin Ivan Borisovich
  • Plotnikov Mikhail Iurevich
RU2792526C1
SOURCE OF INTENSE FLOWS OF LOW-TEMPERATURE PLASMA WITH HIGH DEGREE OF IONISATION 2018
  • Golubev Sergej Vladimirovich
  • Izotov Ivan Vladimirovich
  • Razin Sergej Vladimirovich
  • Sidorov Aleksandr Vasilevich
  • Skalyga Vadim Aleksandrovich
  • Shaposhnikov Roman Anatolevich
RU2695819C1
GAS JET METHOD FOR DEPOSITION OF DIAMOND FILMS WITH ACTIVATION IN MICROWAVE DISCHARGE PLASMA 2022
  • Rebrov Aleksei Kuzmich
  • Timoshenko Nikolai Ivanovich
  • Emelianov Aleksei Alekseevich
  • Iudin Ivan Borisovich
  • Plotnikov Mikhail Iurevich
  • Isupov Mikhail Vitalevich
RU2788258C1
HIGH-CURRENT SOURCE OF MULTICHARGE IONS BASED ON PLASMA OF ELECTRONIC-CYCLOTRONIC RESONANT DISCHARGE RETAINED IN OPEN MAGNETIC TRAP 2011
  • Golubev Sergej Vladimirovich
  • Zorin Vladimir Gur'Evich
  • Vodop'Janov Aleksandr Valentinovich
  • Bokhanov Aleksej Feliksovich
  • Razin Sergej Vladimirovich
  • Mansfel'D Dmitrij Anatol'Evich
  • Kazakov Mikhail Jur'Evich
  • Sidorov Aleksandr Vasil'Evich
  • Izotov Ivan Vladimirovich
  • Skalyga Vadim Aleksandrovich
  • Koldanov Vladimir Aleksandrovich
RU2480858C2

RU 2 416 677 C1

Authors

Vikharev Anatolij Leont'Evich

Gorbachev Aleksej Mikhajlovich

Denisov Grigorij Gennad'Evich

Sobolev Dmitrij Igorevich

Dates

2011-04-20Published

2009-10-06Filed