METHOD FOR FORMATION OF CARBON NANOSTRUCTURES Russian patent published in 2011 - IPC B82B3/00 

FIELD: nanotechnologies.

SUBSTANCE: invention relates to methods for formation of carbon nanostructures (CNS) massifs for field emission applications. Method to form CNS massifs consists in application of multilayer coating onto an arbitrary substrate or an instrument structure, containing adhesive and catalytic layers of nanosize thickness, arrangement of specified pattern on it, and placement of the produced sample into a growing vessel, pumping atmosphere from chamber down to residual pressure below 10^-5 mm of mercury column, introduction of buffer gas, and also HF or SHF field, or their combination, and further heating of sample with formation of catalytic drops in the catalytic layer. Between the substrate (the instrument structure) and the catalytic layer there is a carbon-containing layer, substrate is heated in the temperature range of 250…650°C, and the nanosize catalytic layer and nanosize catalytic drops formed from it are activate with buffer gas ion flow, samples are cured for 25-70 minutes.

EFFECT: development of efficient method, which makes it possible to form CNS massifs directly from carbon-containing layers and substrates.

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