FIELD: metallurgy.
SUBSTANCE: according to invention panel consists of front substrate containing scanning electrode, supporting electrode, dielectric layer and protective layer and of back substrate containing address electrode, barrier ribs and fluorescent material applied on internal walls of grooves formed with barrier ribs. The procedure consists in generation of film MgO with orientation (111) by sedimentation method from the vapour phase with rate of sedimentation amounting to 280 Ǻ /sec or more and at temperature of substrate of 120°C or less.
EFFECT: simplified production process, facilitating fabrication of layer MgO with orientation due to reduced temperature of sedimentation.
6 cl, 24 dwg
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