METHOD AND APPARATUS FOR MAKING PLASMA DISPLAY PANEL Russian patent published in 2012 - IPC H01J9/39 H01J9/48 

FIELD: physics.

SUBSTANCE: method of making a plasma display panel, where a sealed space is defined between first and second wafers (1, 2) and filled with electric discharge gas, comprises a first degassing step for releasing impurity gas from a protective film formed on the first wafer (1) in order to protect the first wafer (1) from plasma electric discharge, by heating the first wafer (1) to temperature higher than 280°C in a vacuum space or controlled atmosphere, and a sealing step for bringing the first wafer (1), where impurity gas is released from the protective film, into contact with the second wafer (2) and for sealing the space in between. Since the impurity gas is released from the protective film before the first wafer comes into contact with the second wafer, and while removal conductivity is high, cleaning can be carried out in a short time. Further, since the protective film is heated to over 280°C, almost 70% or more of the impurity gas adsorbed on the protective film can be released.

EFFECT: providing a method and apparatus for making a plasma display panel, which improve the throughput of a plasma display panel manufacturing line and energy efficiency thereof.

16 cl, 16 dwg