FIELD: process engineering.
SUBSTANCE: invention relates to crystallographic substrates and method of their finishing. Proposed method comprises defining parameters of monocrystalline body crystallographic orientation and calculating the angle of grain-boundary between selected monocrystalline body crystallographic direction and projection of crystallographic direction along the plane of monocrystalline body first outer main surface. Then, material is removed from at least a part of said first outer main surface to vary aforesaid angle.
EFFECT: production of high-quality large-size substrates.
15 cl, 9 dwg
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Authors
Dates
2012-01-27—Published
2008-06-25—Filed