FIELD: metallurgy.
SUBSTANCE: manufacturing method of composite target for obtaining films by magnetron sputtering and target obtained using the above method is proposed. Method involves manufacture of disc from polycrystalline titanium ingot obtained by multiple vacuum titanium re-melting, drilling of holes in staggered order in sputtered zone of titanium disc along two concentric circles and fixture of cylindrical inserts in them. Cylindrical inserts are made by cutting of ingots of monocrystalline tungsten and monocrystalline rhenium, which have been obtained by multiple vacuum remelting of tungsten and rhenium. Inserts attachment is performed by press fitting to drilled holes at the ratio of surface areas occupied with tungsten and rhenium inserts on surface of target in titanium disc providing the production of films consisting of the following, wt %: titanium 2.5-37.0, rhenium 0.04-9.78, and tungsten is the rest.
EFFECT: improving reliability and process barrier layers due to decreasing mechanical stresses and improving homogeneity of metal coating.
2 cl, 1 tbl, 1 ex
