FIELD: physics.
SUBSTANCE: apparatus for plasma activated vapour deposition for making silicon thin-film modules of a solar cell includes means of mounting the substrate, said substrate having an outer surface and an inner surface, a plasma burner mounted near said inner surface for deposition of at least one layer of a thin-film on said inner surface of said substrate, and means of feeding chemicals to said plasma burner, where said at least one thin-film layer forms said silicon thin-film modules of a solar cell.
EFFECT: high rate of depositing layers of modules of solar cells, low cost of making said modules.
33 cl, 8 dwg
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