DEVICE AND METHOD FOR PLASMA CHEMICAL DEPOSITION FROM VAPOR PHASE Russian patent published in 2012 - IPC C03B37/18 

Abstract RU 2466943 C2

FIELD: metallurgy.

SUBSTANCE: proposed device comprises applicator with inner and outer walls and microwave waveguide that enters said applicator. The latter extends around cylindrical axle and has passage adjoining the inner wall for microwaves to flow therein. Bearing tube can be arranged under said cylindrical axle. Said bearing tube and applicator are, in fact, aligned. Applicator is completely surrounded by kiln located above said cylindrical axle In deposition of layers, glass-forming precursors are fed onto inner surface of glass bearing tube to locate the kiln above tube part and applicator and feed microwave power in applicator to create plasma conditions inside said tube. Said applicator and kiln reciprocate along said tube. Note here that kiln part differs from that of applicator.

EFFECT: perfected method.

14 cl, 2 ex, 3 dwg

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RU 2 466 943 C2

Authors

Van Stralen Matteus Jakobus Nikolas

Khartsejker Jokhannes Anton

Linders Moltkhoff Antonius Khenrikus Jokhannes Petrus Marija

Milisevich Igor

Dates

2012-11-20Published

2007-11-13Filed