FIELD: chemical or physical processes.
SUBSTANCE: group of inventions relates to a method and an apparatus for carrying out a plasma-chemical deposition process from a vapor phase. Providing a device comprising a cylindrical resonator provided with an outer cylindrical wall and an inner coaxial cylindrical wall, forming a resonating cavity between each other, extending in circumferential direction around cylindrical axis of inner and outer cylindrical walls. Outer cylindrical wall includes an input port connected to the input waveguide, and also comprises slot-like sections extending circumferentially around cylindrical axis. Providing operation of said device on operating frequency, at which maximum size determining aperture of slit-like sections is less than half the wavelength of operating frequency.
EFFECT: uniform distribution of plasma in circumferential direction, which improves degree of axisymmetry during plasma-chemical deposition.
14 cl, 5 dwg
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