FIELD: chemistry.
SUBSTANCE: invention relates to device for plasma chemical deposition from vapor phase. Cylindrical resonator of device of plasma chemical deposition from of glass material vapor phase on inner surface of substrate in form of tube comprises outer cylindrical wall, made with resonant cavity passing in peripheral direction around cylinder axis, side wall with parts enclosing resonance chamber in direction of cylinder axis and slot structure located in peripheral direction around axis of cylinder providing access of microwave energy from resonant chamber radially inside said tube. Slot structure comprises slotted sections mutually shifted towards cylinder.
EFFECT: deposition of material with considerably smaller or even zero heterogeneity of thickness and/or refraction index is provided.
17 cl, 8 dwg
