FIELD: process engineering.
SUBSTANCE: invention relates to evacuating equipment, particularly, to vacuum deposition of films using electromagnetic radiation. Proposed device comprises evacuated reaction chamber accommodating isolated substrate holder shaped to hollow truncated composition pyramid, substrate holder heater, reagent feed system, vacuum system, electrically connected electromagnetic radiation source, electric vacuum inlet, electromagnetic radiation actuator, and shield composed of metal earthed barrel arranged around substrate holder. Substrate holder truncated side has cover with antifriction plate arranged on cover outer side and working substrates arranged on holder sides. Said electromagnetic radiation actuator is composed of detachable hollow cylindrical case split perpendicular to vertical axis and provided with centering groove on inner horizontal surface. Said cylindrical case houses helical spring and disk-shaped pusher reciprocating along vertical axis of aforesaid hollow cylindrical case. Aforesaid substrate holder heater, reagent feed system, vacuum system, electrically connected electromagnetic radiation source, electric vacuum inlet, electromagnetic radiation actuator, and shield are aligned. Inclination of substrate holder relative to vertical axis on outer side does not exceed three degrees.
EFFECT: higher quality, reproducibility and efficiency.
4 cl, 1 dwg, 1 ex
Title | Year | Author | Number |
---|---|---|---|
APPARATUS FOR ION-PLASMA ETCHING AND DEPOSITING THIN FILMS | 2013 |
|
RU2540318C2 |
MICROWAVE PLASMA REACTOR | 2023 |
|
RU2804043C1 |
DEVICE FOR ION-PLASMA APPLICATION OF MULTICOMPONENT FILMS IN VACUUM | 2013 |
|
RU2522506C1 |
VACUUM MATERIAL APPLICATION DEVICE | 2011 |
|
RU2471883C1 |
DEVICE FOR MONITORING OF THICKNESS OF CONDUCTING FILM OF ITEMS BELONGING TO ELECTRONIC EQUIPMENT | 2012 |
|
RU2495370C1 |
DIAMOND COATING DEVICE | 2022 |
|
RU2792526C1 |
DEVICE FOR LOCAL PLASMA-CHEMICAL ETCHING OF SUBSTRATES | 2010 |
|
RU2451114C2 |
MICROWAVE PLASMOCHEMICAL REACTOR FOR PRODUCING SYNTHETIC DIAMONDS | 2022 |
|
RU2803644C1 |
EQUIPMENT FOR PRECIPITATION OF LAYERS FROM GASEOUS PHASE | 1991 |
|
RU2014670C1 |
VACUUM ION-PLASMA PLANT FOR APPLYING COATINGS ON SURFACE OF METAL INTRAVASCULAR STENTS, MAINLY FROM TITANIUM OXYNITRIDE | 2019 |
|
RU2705839C1 |
Authors
Dates
2012-11-20—Published
2011-05-11—Filed