FIELD: power industry.
SUBSTANCE: method for removing radioactive film from object surface consists in formation of laser emission beam on object surface, scanning of dirty object surface by means of formed laser emission beam through film material that is transparent for laser emission; at that, the above film material is arranged between laser emission source and dirty surface of the object; after scanning is completed, film material is removed. Prior to scanning operation between object surfaces and transparent film material there created is constant electric field U by means of an electrode such that energy Ae transferred to positively charged particle in electric field exceeds kinetic energy Ak of that particle, and electric field has reverse polarity in relation to particles spread during laser deactivation; value of electric field shall exceed the following value: where k - Boltzmann constant, T - particle temperature, L - distance between treated surface and mesh, d - distance between treated surface and transparent adsorbing film, q - particle charge.
EFFECT: invention allows increasing the efficiency of radioactive film removal process.
2 cl, 1 dwg
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Authors
Dates
2012-11-27—Published
2011-08-03—Filed