FIELD: electricity.
SUBSTANCE: method to control voltage of power semiconductor instrument switching with a semiconductor structure, comprising a triode zone of p+-n-p-type, surrounded with at least one thyristor zone of p+-n-p-n+-type, includes local radiation by protons, using a special screen, and subsequent thermal annealing in order to establish hydrogen-containing donors in the basic n-layer within the triode zone of p+-n-p-type, having maximum concentration in the area enclosed between the collector p-n-transition and the middle of the basic n-layer, at the same time the depth of burial of maximum concentration of hydrogen-containing donors in the basic n-layer hm [mcm], and a dose of protons Φnb [cm-2] is determined based on empirical expressions depending on the specific resistance of initial silicon, spread of its values and specified level of reduction of avalanche breakdown voltage in the collector p-n-transition.
EFFECT: invention makes it possible to reduce labour intensiveness of the process for control of switching voltage of a power semiconductor instrument and to increase percentage of yield.
1 dwg, 1 tbl
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Authors
Dates
2013-02-10—Published
2011-09-21—Filed