VACUUM ARC PLASMA SOURCE Russian patent published in 2013 - IPC C23C14/35 

FIELD: electrical engineering.

SUBSTANCE: cathode assembly includes a cathode (1), the cathode cooling means and the cathode (1) holder (2), an anode, an arc discharge power supply unit and a magnetic system for control of cathode spots movement across the cathode working surface (MSCCSM). MSCCSM includes at least one basic magnetic field source (3) positioned close to the cathode surface on the cathode holder side, a magnetic conductor (4), a controllable power supply unit, a magnetic screen (9) and at least one additional magnetic field source (AMFS). AMFS includes an additional magnetic conductor (5) with a magnetic pole positioned close to the cathode (1) surface on the cathode holder side and a controlling electromagnetic coil mounted on the additional magnetic conductor and connected to the controllable power supply unit. The power supply unit is designed to that to enable periodical adjustment of current flowing through the controlling electromagnetic coil. The magnetic screen (9) is positioned between the basic magnetic field source and the controlling electromagnetic coil.

EFFECT: ensuring uniform depletion of the cathode material and generation of plasma fluxes with minimum drop fraction content which results in improved quality of coatings applied.

8 cl, 6 dwg