FIELD: metallurgy.
SUBSTANCE: plasma flows are transported in a plasma-optic system from an electric arc evaporator to an outlet of the plasma source under action of a transporting magnetic field created using electromagnetic coils. Magnetic field has both a constant component and additional components varying as to intensity. Intensity of each of the additional magnetic fields is increased at approximation of the plasma flow to the surface of the plasma source structural element and decreased at its moving away from it. Vacuum arc power supply (15) of the device is connected to anode (2) through winding (16) of an electromagnetic coil that encloses it. In a straight-line version of the plasma-optic system an electrically conducting piece of pipe (11) inside anode (2) is electrically connected to one end of winding (12) arranged in it of a diverting electromagnetic coil. The second end of that winding is connected to a positive pole of vacuum arc power supply (15). In a plasma line the plasma flow is influenced by an additional magnetic field generated by means of the additional electromagnetic coil enclosing the plasma line.
EFFECT: considerable reduction of losses of the plasma cleaned from macroparticles.
13 cl, 1 dwg
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Authors
Dates
2014-02-20—Published
2011-09-01—Filed