METHOD OF PRODUCING PHOSPHOR IN FORM OF AMORPHOUS FILM OF SILICON DIOXIDE WITH SELENIUM IONS ON SILICON SUBSTRATE Russian patent published in 2014 - IPC C23C14/48 C23C14/58 C23C14/06 

Abstract RU 2504600 C1

FIELD: chemistry.

SUBSTANCE: method involves implanting selenium ions with ion energy of 300±30 keV with fluence of 4-6-1016 ions/cm2 into said film and first annealing at temperature of 900-1000°C for 1-1.5 hours in an atmosphere of dry nitrogen. The film is further annealed at temperature of 500-650°C for 1.5-2.5 hours in an air atmosphere.

EFFECT: high stability of the photoluminescence spectrum of the phosphor having luminescent radiation in the visible region.

1 dwg, 1 tbl, 3 ex

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RU 2 504 600 C1

Authors

Zatsepin Anatolij Fedorovich

Kortov Vsevolod Semenovich

Buntov Evgenij Aleksandrovich

Dates

2014-01-20Published

2012-11-06Filed