FIELD: chemistry.
SUBSTANCE: one of the versions of producing silicon filaments in form of rods and/or substrates with an arbitrary cross-section from high-purity silicon involves continuous fusion casting of silicon downwards on a seeding agent through a draw plate situated between the melt zone and an inductor in an atmosphere of oxygen, cooling the obtained filament by immersion in a coolant, wherein seeding is carried out below the plane of the draw plate; the level of the coolant is set and kept near the crystallisation front, and the crystallisation front of silicon rods and/or substrates is held below the plane of the draw plate at a distance of 0.5-20 mm.
EFFECT: obtaining silicon filaments characterised by low electrical resistance, which are subject to heating when transmitting electric current at industrial frequency through said filaments from a low-voltage source, while maintaining a high rate of casting, as well as stable plastic and geometric characteristics of the finished product.
2 cl, 1 dwg
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Authors
Dates
2014-02-20—Published
2012-08-14—Filed