FIELD: nanotechnology.
SUBSTANCE: invention relates to photolithography, namely to a method of manufacturing resistive masks for nanolithography. The method includes silver recovery with the formation of silver nanoparticles and the subsequent stimulation of the process of thermal polymerization of caprolatam on the surface of the obtained nanoparticles by laser excitation of plasmonic oscillations in them. At that for the spatial localization of the silver recovery process the STED-method is used.
EFFECT: invention enables to obtain resistive masks with a minimum element size up to 10 nm.
1 tbl, 1 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| INFRARED DETECTOR AND METHOD FOR PRODUCTION THEREOF | 2018 |
|
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| METHOD FOR FORMATION OF PLANAR STRUCTURES BY THE METHOD OF ATOMIC-POWER LITHOGRAPHY | 2017 |
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|
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| MASK FOR NEAR-FIELD LITHOGRAPHY AND ITS MANUFACTURE | 2011 |
|
RU2544280C2 |
| PROCESS OF FORMATION OF RELIEF ON SURFACE OF FUNCTIONAL LAYER | 1999 |
|
RU2164706C1 |
| METHOD OF FORMING RELIEF ON FUNCTIONAL LAYER SURFACE | 1999 |
|
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| ACTIVATION OF PHOTOPOLYMERIZATION USING NEAR IR-RADIATION | 2015 |
|
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| METHOD OF PRODUCING A PLASMON FILM STRUCTURE FROM ADDITIVE POWDERS BASED ON ALUMINUM | 2017 |
|
RU2689479C1 |
| THE METHOD OF PRODUCTION OF THE TOPOLOGICAL IMAGE IN THE CHROME FILM | 2010 |
|
RU2442239C1 |
| METHOD OF RECORDING OPTICAL INFORMATION IN A PHOTOTHERMOREFRACTIVE GLASS | 2017 |
|
RU2658114C1 |
